Reliability wearout mechanisms in advanced CMOS technologies / (Record no. 59604)

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fixed length control field 03315nam a2200889 i 4500
001 - CONTROL NUMBER
control field 5361029
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20200421114117.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 110519t20152009njua ob 001 0 eng d
015 ## - NATIONAL BIBLIOGRAPHY NUMBER
-- 015-17502 (print)
015 ## - NATIONAL BIBLIOGRAPHY NUMBER
-- GBA944641 (print)
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
-- paper
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
-- electronic
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 9780470455265
-- electronic
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
-- paper
245 00 - TITLE STATEMENT
Title Reliability wearout mechanisms in advanced CMOS technologies /
300 ## - PHYSICAL DESCRIPTION
Number of Pages 1 PDF (xv, 624 pages) :
490 1# - SERIES STATEMENT
Series statement IEEE Press series on microelectronic systems ;
505 0# - FORMATTED CONTENTS NOTE
Remark 2 Introduction / Alvin W. Strong -- Dielectric characterization and reliability methodology / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Su�n�e -- Dielectric breakdown of gate oxides: physics and experiments / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Su�n�e -- Negative bias temperature instabilities in pMOSFET devices / Giuseppe LaRosa -- Hot carriers / Stewart E. Rauch, III -- Stress-induced voiding / Timothy D. Sullivan -- Electromigration / Timothy D. Sullivan.
650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1
General subdivision Reliability.
700 1# - AUTHOR 2
Author 2 Strong, Alvin Wayne,
856 42 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier http://ieeexplore.ieee.org/xpl/bkabstractplus.jsp?bkn=5361029
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type eBooks
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-- Piscataway, New Jersey :
-- IEEE Press,
-- c2009.
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-- text
-- rdacontent
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-- electronic
-- isbdmedia
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-- online resource
-- rdacarrier
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-- Description based on PDF viewed 12/18/2015.
650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Metal oxide semiconductors, Complementary
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-- Wires
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-- Stress
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-- Substrates
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-- Transistors
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-- Silicon
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-- Strain
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-- Nitrogen
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-- Reliability
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-- Reliability engineering
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-- MOSFET circuits
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-- Materials
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-- Metallization
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-- Interface states
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-- Junctions
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-- Logic gates
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-- Force
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-- Hot carriers
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-- Indexes
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-- Electric breakdown
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-- Electromigration
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-- Electron traps
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-- Degradation
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-- Dielectrics
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-- CMOS integrated circuits
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-- CMOS technology
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-- Charge carrier processes
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-- Atomic measurements
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-- Books
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-- Acceleration

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