Normal view MARC view ISBD view

PRINCIPLES OF PHYSICAL VAPOR DEPOSITION OF THIN FILMS

Material type: materialTypeLabel

BookPublisher: Amsterdam Elsevier 2006Description: xi+1160p.,24x16Cms.ISBN: 080044699X.DDC classification: 621.38172 H254

average rating: 0.0 (0 votes)

Item type	Current location	Call number	Status	Date due	Barcode
Books	CENTRAL LIBRARY	621.38172 H254 (Browse shelf)	Available		080394

Previous		No cover image available		No cover image available		No cover image available		Next
Previous	621.38171 H254 QUANTUM THEORY OF THE OPTICAL AND ELECTRONIC PROPERTIES OF SEMICONDUCTORS	621.38171 I551 NANO-SEMI CONDUCTORS DEVICES AND TECHNOLOGY	621.38171 S912 CHARACTERIZATION IN COMPOUND SEMICONDUCTOR PROCESSING	621.38172 H254 PRINCIPLES OF PHYSICAL VAPOR DEPOSITION OF THIN FILMS	621.38172 S493 HANDBOOK OF THIN- FILM DEPOSITION PROCESSES AND TECHNIQUES:PRINCIPLES,METHODS,EQ	621.38172 S493 HANDBOOK OF THIN FILM DEPOSITION	621.38172 S493 HANDBOOK OF THIN- FILM DEPOSITION PROCESSES AND TECHNIQUES:PRINCIPLES,METHODS,EQ	Next

There are no comments for this item.

More book reviews at iDreamBooks.com

Central Library