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Advanced Concepts and Architectures for Plasma-Enabled Material Processing [electronic resource] / by Oleg O. Baranov, Igor Levchenko, Shuyan Xu, Kateryna Bazaka.

By: Baranov, Oleg O [author.].
Contributor(s): Levchenko, Igor [author.] | Xu, Shuyan [author.] | Bazaka, Kateryna [author.] | SpringerLink (Online service).
Material type: materialTypeLabelBookSeries: Synthesis Lectures on Emerging Engineering Technologies: Publisher: Cham : Springer International Publishing : Imprint: Springer, 2020Edition: 1st ed. 2020.Description: VIII, 82 p. online resource.Content type: text Media type: computer Carrier type: online resourceISBN: 9783031020353.Subject(s): Engineering | Electrical engineering | Electronic circuits | Computers | Materials science | Surfaces (Technology) | Thin films | Technology and Engineering | Electrical and Electronic Engineering | Electronic Circuits and Systems | Computer Hardware | Materials Science | Surfaces, Interfaces and Thin FilmAdditional physical formats: Printed edition:: No title; Printed edition:: No title; Printed edition:: No titleDDC classification: 620 Online resources: Click here to access online
Contents:
Introduction -- Technological Plasmas and Typical Schematics -- Plasma Parameters with Respect to Material Processing -- How to Control Plasma Parameters -- Material Processing -- Perspectives and Trends -- Conclusion -- Authors' Biographies.
In: Springer Nature eBookSummary: Plasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.
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Introduction -- Technological Plasmas and Typical Schematics -- Plasma Parameters with Respect to Material Processing -- How to Control Plasma Parameters -- Material Processing -- Perspectives and Trends -- Conclusion -- Authors' Biographies.

Plasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.

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