| 000 | 06141nam a2201165 i 4500 | ||
|---|---|---|---|
| 001 | 5201952 | ||
| 003 | IEEE | ||
| 005 | 20200421114109.0 | ||
| 006 | m o d | ||
| 007 | cr |n||||||||| | ||
| 008 | 151221s2006 njua ob 001 eng d | ||
| 020 |
_a9780471790280 _qebook |
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| 020 |
_z0471784060 _qcloth : alk. paper |
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| 020 |
_z9780471784067 _qcloth : print |
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| 020 |
_z0471790281 _qelectronic |
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| 024 | 7 |
_a10.1002/0471790281 _2doi |
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| 035 | _a(CaBNVSL)mat05201952 | ||
| 035 | _a(IDAMS)0b0000648104af7b | ||
| 040 |
_aCaBNVSL _beng _erda _cCaBNVSL _dCaBNVSL |
||
| 050 | 4 |
_aTK7871.85 _b.M379 2006eb |
|
| 082 | 0 | 4 |
_a621.3815/2 _222 |
| 100 | 1 |
_aMay, Gary S., _eauthor. |
|
| 245 | 1 | 0 |
_aFundamentals of semiconductor manufacturing and process control / _cGary S. May, Costas J. Spanos. |
| 264 | 1 |
_a[Piscataway, New Jersey] : _bIEEE, _cc2006. |
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| 264 | 2 |
_a[Piscataqay, New Jersey] : _bIEEE Xplore, _c[2006] |
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| 300 |
_a1 PDF (xix, 463 pages) : _billustrations. |
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| 336 |
_atext _2rdacontent |
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| 337 |
_aelectronic _2isbdmedia |
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| 338 |
_aonline resource _2rdacarrier |
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| 504 | _aIncludes bibliographical references and index. | ||
| 505 | 0 | _aIntroduction to semiconductor manufacturing -- Technology overview -- Process monitoring -- Statistical fundamentals -- Yield modeling -- Statistical process control -- Statistical experimental design -- Process modeling -- Advanced process control -- Process and equipment diagnosis. | |
| 506 | 1 | _aRestricted to subscribers or individual electronic text purchasers. | |
| 520 | _aA practical guide to semiconductor manufacturing from process control to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Control covers all issues involved in manufacturing microelectronic devices and circuits, including fabrication sequences, process control, experimental design, process modeling, yield modeling, and CIM/CAM systems. Readers are introduced to both the theory and practice of all basic manufacturing concepts. Following an overview of manufacturing and technology, the text explores process monitoring methods, including those that focus on product wafers and those that focus on the equipment used to produce wafers. Next, the text sets forth some fundamentals of statistics and yield modeling, which set the foundation for a detailed discussion of how statistical process control is used to analyze quality and improve yields. The discussion of statistical experimental design offers readers a powerful approach for systematically varying controllable process conditions and determining their impact on output parameters that measure quality. The authors introduce process modeling concepts, including several advanced process control topics such as run-by-run, supervisory control, and process and equipment diagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and management of overall manufacturing systems * Chapters include case studies, sample problems, and suggested exercises * Instructor support includes electronic copies of the figures and an instructor's manual Graduate-level students and industrial practitioners will benefit from the detailed exami?nation of how electronic materials and supplies are converted into finished integrated circuits and electronic products in a high-volume manufacturing environment. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department. An Instructor Support FTP site is also available. | ||
| 530 | _aAlso available in print. | ||
| 538 | _aMode of access: World Wide Web | ||
| 588 | _aDescription based on PDF viewed 12/21/2015. | ||
| 650 | 0 |
_aSemiconductors _xDesign and construction. |
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| 650 | 0 |
_aIntegrated circuits _xDesign and construction. |
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| 650 | 0 |
_aProcess control _xStatistical methods. |
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| 655 | 0 | _aElectronic books. | |
| 695 | _aAdaptation model | ||
| 695 | _aAnalysis of variance | ||
| 695 | _aAnalytical models | ||
| 695 | _aArtificial neural networks | ||
| 695 | _aAssembly | ||
| 695 | _aCircuit faults | ||
| 695 | _aComputers | ||
| 695 | _aControl charts | ||
| 695 | _aControl systems | ||
| 695 | _aData models | ||
| 695 | _aDatabases | ||
| 695 | _aDesign methodology | ||
| 695 | _aElectrical resistance measurement | ||
| 695 | _aElectronics industry | ||
| 695 | _aFabrication | ||
| 695 | _aFault diagnosis | ||
| 695 | _aGaussian distribution | ||
| 695 | _aIndexes | ||
| 695 | _aIntegrated circuit modeling | ||
| 695 | _aIntegrated circuits | ||
| 695 | _aLogic gates | ||
| 695 | _aManufacturing | ||
| 695 | _aManufacturing processes | ||
| 695 | _aMarketing and sales | ||
| 695 | _aMathematical model | ||
| 695 | _aMetals | ||
| 695 | _aMonitoring | ||
| 695 | _aOptical interferometry | ||
| 695 | _aOptical surface waves | ||
| 695 | _aOptical variables measurement | ||
| 695 | _aOxidation | ||
| 695 | _aPlasma temperature | ||
| 695 | _aPollution measurement | ||
| 695 | _aPredictive models | ||
| 695 | _aPresses | ||
| 695 | _aPrincipal component analysis | ||
| 695 | _aProbability | ||
| 695 | _aProbability distribution | ||
| 695 | _aProcess control | ||
| 695 | _aQuality control | ||
| 695 | _aRandom variables | ||
| 695 | _aReal time systems | ||
| 695 | _aResponse surface methodology | ||
| 695 | _aSemiconductor device measurement | ||
| 695 | _aSemiconductor device modeling | ||
| 695 | _aSemiconductor process modeling | ||
| 695 | _aSilicon | ||
| 695 | _aSilicon compounds | ||
| 695 | _aStatistical analysis | ||
| 695 | _aSurface treatment | ||
| 695 | _aTemperature control | ||
| 695 | _aTesting | ||
| 695 | _aTime measurement | ||
| 700 | 1 | _aSpanos, Costas J. | |
| 710 | 2 |
_aJohn Wiley & Sons, _epublisher. |
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| 710 | 2 |
_aIEEE Xplore (Online service), _edistributor. |
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| 776 | 0 | 8 |
_iPrint version: _z9780471784067 |
| 856 | 4 | 2 |
_3Abstract with links to resource _uhttp://ieeexplore.ieee.org/xpl/bkabstractplus.jsp?bkn=5201952 |
| 942 | _cEBK | ||
| 999 |
_c59291 _d59291 |
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