000 | 07480cam a2200685 i 4500 | ||
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001 | on1098231017 | ||
003 | OCoLC | ||
005 | 20220711203517.0 | ||
006 | m o d | ||
007 | cr ||||||||||| | ||
008 | 190416t20192019nju ob 001 0 eng | ||
010 | _a 2019018492 | ||
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019 | _a1104602721 | ||
020 |
_a9781119296454 _qAdobe electronic book |
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020 |
_a1119296455 _qAdobe electronic book |
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020 |
_z9781119296782 _qelectronic publication |
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020 | _z1119296781 | ||
020 |
_a9781119296447 _qelectronic book |
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020 |
_a1119296447 _qelectronic book |
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020 |
_z9781119296461 _qhardcover |
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020 | _z1119296463 | ||
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_aCHVBK _b568742494 |
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_a(OCoLC)1098231017 _z(OCoLC)1104602721 |
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042 | _apcc | ||
050 | 4 |
_aTA418.78 _b.C475 2019 |
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_aTEC _x009000 _2bisacsh |
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_aTEC _x035000 _2bisacsh |
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082 | 0 | 0 |
_a620.1/15 _223 |
049 | _aMAIN | ||
100 | 1 |
_aChakraborty, Jayanta, _d1976- _eauthor. _98358 |
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245 | 1 | 0 |
_aEngineering of submicron particles : _bfundamental concepts and models / _cJayanta Chakraborty, Department of Chemical Engineering, Indian Institute of Technology, Kharagpur, India. |
264 | 1 |
_aHoboken, NJ, USA : _bJohn Wiley & Sons, Inc., _c2019. |
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264 | 4 | _c©2019 | |
300 | _a1 online resource (205 pages) | ||
336 |
_atext _btxt _2rdacontent |
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337 |
_acomputer _bn _2rdamedia |
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338 |
_aonline resource _bnc _2rdacarrier |
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504 | _aIncludes bibliographical references and index. | ||
505 | 0 | _aIntro; Title Page; Copyright Page; Contents; Preface; About the Companion Website; Chapter 1 Nucleation; 1.1 Thermodynamics of Interfaces; 1.1.1 The Interface is a Surface of High Energy; 1.1.2 The Interface is a Surface Under Tension; 1.1.3 Pressure Drop Across Curved Interfaces; 1.1.3.1 Capillary Rise; 1.1.4 Vapour-Liquid Equilibrium Across Curved Interfaces; 1.1.4.1 Thomson Equation; 1.1.5 Stability of the Equilibrium; 1.2 Homogeneous Nucleation; 1.2.1 Energetics of Homogeneous Nucleation; 1.2.1.1 Energetics in Terms of Number of Units; 1.2.2 Kinetics of Homogeneous Nucleation | |
505 | 8 | _a1.2.2.1 Concentration of Embryos/Nuclei1.2.2.2 Chain of Reactions Towards Formation of Nuclei; 1.2.2.3 Algebraic Manipulation of the Rate Expression; 1.2.2.4 Various Forms of Homogeneous Nucleation Rate; 1.2.3 Experimental Aspects of Homogeneous Nucleation; 1.2.3.1 Investigation Using a Cloud Chamber; 1.2.3.2 Other Methods; 1.3 Non-Homogeneous Nucleation; 1.3.1 Heterogeneous Nucleation; 1.3.2 Nucleating Agents and Organizers; 1.3.3 Secondary Nucleation; 1.4 Exercises; Bibliography; Chapter 2 Growth; 2.1 Traditional Crystal Growth Models; 2.1.1 Diffusion Controlled Growth | |
505 | 8 | _a2.1.2 Surface Nucleation Controlled Growth2.1.2.1 Rate of Mononuclear Growth; 2.1.3 Surface Dislocation Controlled Growth: BCF Theory; 2.1.3.1 Rate of Surface Dislocation Controlled Growth; 2.2 Face Growth Theories; 2.2.1 Shape of a Crystal; 2.2.2 Laws of Face Growth; 2.2.2.1 Law of Bravais and Friedel; 2.2.3 Flat, Stepped, and Kinked Faces; 2.3 Measurement of Particle Size and Shape; 2.3.1 Optical Microscopy; 2.3.2 Electron Microscopy; 2.3.3 Light Scattering; 2.3.3.1 Rayleigh Scattering; 2.3.3.2 Static and Dynamic Light-Scattering Techniques; 2.4 Exercises; Bibliography | |
505 | 8 | _aChapter 3 Inter-Particle Forces3.1 Inter-Molecular Forces; 3.1.1 Charge-Charge Interactions; 3.1.2 Charge-Dipole Interactions; 3.1.3 Dipole-Dipole Interactions; 3.1.4 Dipole-Induced Dipole Interactions; 3.1.5 Induced Dipole-Induced Dipole Interactions; 3.1.6 van der Waals Interaction; 3.1.7 Repulsive Potential and the Net Interaction Energy; 3.2 Inter-Particle Forces; 3.2.1 Hamaker's Pairwise Additivity Approach; 3.2.2 Lifshitz's Theory; 3.3 Measurement of Inter-Molecular Forces; 3.4 Measurement of Forces between Surfaces; 3.5 Exercises; Bibliography; Chapter 4 Stability; Charged Interface | |
505 | 8 | _a4.1 Electrostatic Potential Near a Charged Surface4.2 Solution of the Poisson-Boltzmann Equation; 4.3 Repulsive Force between Two Surfaces; 4.4 Steric Stabilization; 4.5 Kinetics of Stability; 4.5.1 Diffusion of Colloidal Particles; 4.5.2 Particle Aggregation in the Absence of Potential; 4.5.3 Particle Aggregation in the Presence of a Net Potential; 4.6 Measurement of Surface Potential; 4.6.1 Surface Potential When Rs > −1; 4.7 Exercises; Bibliography; Chapter 5 Elementary Concepts of Number Balance; 5.1 State of a Particle | |
520 | _aBrings together in one place the fundamental theory and models, and the practical aspects of submicron particle engineering This book attempts to resolve the tricky aspects of engineering submicron particles by discussing the fundamental theories of frequently used research tools-both theoretical and experimental. The first part covers the Fundamental Models and includes sections on nucleation, growth, inter-molecular and inter-particle forces, colloidal stability, and kinetics. The second part examines the Modelling of a Suspension and features chapters on fundamental concepts of particulate systems, writing the number balance, modelling systems with particle breakage and aggregation, and Monte Carlo simulation. The book also offers plenty of diagrams, software, examples, brief experimental demonstrations, and exercises with answers. Engineering of Submicron Particles: Fundamental Concepts and Models offers a lengthy discussion of classical nucleation theory, and introduces other nucleation mechanisms like organizer mechanisms. It also looks at older growth models like diffusion controlled or surface nucleation controlled growth, along with new generation models like connected net analysis. Aggregation models and inter-particle potentials are touched upon in a prelude on intermolecular and surface forces. The book also provides analytical and numerical solutions of population balance models so readers can solve basic population balance equations independently. -Presents the fundamental theory, practical aspects, and models of submicron particle engineering -Teaches readers to write number balances for their own system of interest -Provides software with open code for solution of population balance model through discretization -Filled with diagrams, examples, demonstrations, and exercises Engineering of Submicron Particles: Fundamental Concepts and Models will appeal to researchers in chemical engineering, physics, chemistry, engineering, and mathematics concerned with particulate systems. It is also a good text for advanced students taking particle technology courses. | ||
588 | _aDescription based on online resource; title from digital title page (viewed on August 27, 2019). | ||
650 | 0 |
_aNanoparticles. _97280 |
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650 | 7 |
_aTECHNOLOGY & ENGINEERING / Engineering (General) _2bisacsh _98359 |
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650 | 7 |
_aTECHNOLOGY & ENGINEERING / Reference _2bisacsh _98360 |
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650 | 7 |
_aNanoparticles. _2fast _0(OCoLC)fst01032624 _97280 |
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655 | 4 |
_aElectronic books. _93294 |
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776 | 0 | 8 |
_iPrint version: _aChakraborty, Jayanta, 1976- author. _tEngineering of submicron particles _dHoboken, NJ, USA : John Wiley & Sons, Inc., [2019] _z9781119296461 _w(DLC) 2019015637 |
856 | 4 | 0 |
_uhttps://doi.org/10.1002/9781119296447 _zWiley Online Library |
942 | _cEBK | ||
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999 |
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