000 01608cam a2200469Mi 4500
001 9780203744307
003 FlBoTFG
005 20220711211859.0
006 m o d
007 cr |||||||||||
008 180517s2018 enk o 000 0 eng d
040 _aOCoLC-P
_beng
_erda
_epn
_cOCoLC-P
020 _a9781351425742
_q(ePub ebook)
020 _a1351425749
020 _a9781351425759
_q(PDF ebook)
020 _a1351425757
_q(PDF ebook)
020 _a9781351425735
_q(Mobipocket ebook)
020 _a1351425730
_q(Mobipocket ebook)
020 _a9780203744307
_q(ebook)
020 _a0203744306
_q(ebook)
024 7 _a10.1201/9780203744307
_2doi
035 _a(OCoLC)1051975786
035 _a(OCoLC-P)1051975786
050 4 _aTK7871.85
082 0 4 _a621.38152
_223
100 0 _aDonovan,
_eauthor.
_910751
245 1 0 _aParticle control for semiconductor manufacturing /
_cedited by R.P. Donovan.
250 _a1st
264 1 _aLondon :
_bRoutledge,
_c2018.
300 _a1 online resource
336 _atext
_btxt
_2rdacontent
337 _acomputer
_bc
_2rdamedia
338 _aonline resource
_bcr
_2rdacarrier
588 _aOCLC-licensed vendor bibliographic record.
650 0 _aSemiconductors
_xDesign and construction.
_93787
650 0 _aSemiconductors
_xDefects.
_910752
650 0 _aParticles.
_910753
700 1 _aDonovan, R. P.,
_eeditor.
_910754
856 4 0 _3Taylor & Francis
_uhttps://www.taylorfrancis.com/books/9780203744307
856 4 2 _3OCLC metadata license agreement
_uhttp://www.oclc.org/content/dam/oclc/forms/terms/vbrl-201703.pdf
942 _cEBK
999 _c69794
_d69794