000 03285cam a2200265Ii 4500
001 9781315220833
008 180331s2005 flua obf 001 0 eng d
020 _a9781315220833
_q(e-book : PDF)
020 _a9781315220833
_q(e-book)
020 _a9781351828031
_q(e-book: Mobi)
020 _z9780824753740
_q(hardback)
024 7 _a10.1201/9781420028782
_2doi
035 _a(OCoLC)62290974
050 4 _aTK7872.M3
_bH36 2005
082 0 4 _a621.381531
_bH236
245 0 0 _aHandbook of photomask manufacturing technology /
_cedited by Syed Rizvi.
264 1 _aBoca Raton [Fla.] :
_bTaylor & Francis,
_c2005.
300 _a1 online resource (xxiii, 704 pages)
505 0 0 _tpart section I Introduction --
_tchapter 1 Introduction to Mask Making /
_rAndrew G. Zanzal --
_tpart section II Mask Writing --
_tchapter 2 Data Preparation /
_rPaul J.M. van Adrichem and Christian K. Kalus --
_tchapter 3 Mask Writers: An Overview /
_rSergey Babin --
_tchapter 4 E-Beam Mask Writers /
_rNorio Saitou --
_tchapter 5 Laser Mask Writers /
_rChrister Rydberg --
_tpart section III Optical Masks --
_tchapter 6 Optical Masks: An Overview /
_rNobuyuki Yoshioka --
_tchapter 7 Conventional Optical Masks /
_rSyed A. Rizvi --
_tchapter 8 Advanced Optical Masks /
_rWilhelm Maurer --
_tpart section IV NGL Masks --
_tchapter 9 NGL Masks: An Overview /
_rKurt R. Kimmel --
_tchapter 10 Masks for Electron Beam Projection Lithography /
_rHisatak Sano --
_tchapter 11 Masks for Extreme Ultraviolet Lithography /
_rPei-yang Yan --
_tchapter 12 Masks for Ion Projection Lithography /
_rSyed A. Rizvi --
_tchapter 13 Mask for Proximity X-Ray Lithography /
_rMasatoshi Oda --
_tpart section V Mask Processing, Materials, and Pellicles --
_tchapter 14 Mask Substrate /
_rSyed A. Rizvi --
_tchapter 15 Resists for Mask Making /
_rBenjamen Rathsack --
_tchapter 16 Resist Charging and Heating /
_rMin Bai --
_tchapter 17 Mask Processing /
_rSyed A. Rizvi --
_tchapter 18 Mask Materials: Optical Properties /
_rVladimir Liberman --
_tchapter 19 Pellicles /
_rYung-Tsai Yen --
_tpart section VI Mask Metrology, Inspection, Evaluation, and Repairs --
_tchapter 20 Photomask Feature Metrology. James Potzick --
_tchapter 21 Optical Critical Dimension Metrology /
_rRay J. Hoobler --
_tchapter 22 Photomask Critical Dimension Metrology in the Scanning Electron Microscope*,** /
_rMichael T. Postek --
_tchapter 23 Geometrical Characterization of Masks Using SPM /
_rSylvain Muckenhirn --
_tchapter 24 Metrology of Image Placement /
_rMichael T. Takac --
_tchapter 25 Optical Thin-Film Metrology for Photomask Applications /
_rEbru Apak --
_tchapter 26 Phase Measurement Tool for PSM /
_rHal Kusunose --
_tchapter 27 Mask Inspection: Theories and Principles /
_rAnja Rosenbusch --
_tchapter 28 Tool for Inspecting Masks: Lasertec MD 2500 /
_rMakoto Yonezawa --
_tchapter 29 Tools for Mask Image Evaluation /
_rAxel Zibold --
_tchapter 30 Mask Repair /
_rRandall Lee --
_tpart section VII Modeling and Simulation --
_tchapter 31 Modeling and Simulation /
_rAndreas Erdmann.
650 0 _aMasks (Electronics)
_vHandbooks, manuals, etc.
_917613
700 1 _aRizvi, Syed.
_917614
776 0 8 _iPrint version:
_z9780824753740
_w(DLC) 2004059306
856 4 0 _uhttps://www.taylorfrancis.com/books/9781420028782
_zClick here to view.
942 _cEBK
999 _c71584
_d71584