000			04827nam a2200325Ii 4500
001			9780429087967
008			180727s2003 flu b ob 001 0 eng d
020			_a9780429087967 _q(e-book : PDF)
035			_a(OCoLC)123916398
040			_aFlBoTFG _cFlBoTFG _erda
050		4	_aTA418.7
072		7	_aSCI _x013050 _2bisacsh
072		7	_aPNR _2bicscc
082	0	4	_a620.44 _223
245	0	0	_aSurface contamination and cleaning. _nVolume 1 / _cedited by Kash L. Mittal.
250			_aFirst edition.
264		1	_aBoca Raton, FL : _bCRC Press, an imprint of Taylor and Francis, _c2003.
300			_a1 online resource (364 pages)
336			_atext _2rdacontent
337			_acomputer _2rdamedia
338			_aonline resource _2rdacarrier
520	3		_aThis volume documents the proceedings of the International Symposium on Surface Contamination and Cleaning, held in Newark, New Jersey, May 23-25, 2001. A new method using MESERAN technique for measuring surface contamination after solvent extractionB. NewtonBecause of the importance of this topic in many technological areas, tremendous efforts have been devoted to devise novel and more efficient ways to monitor, analyse and characterize contamination on surfaces as well as ways to remove such contamination from a wide variety of surfaces. The technological areas where surface contamination has always been a bete noire and thus surface cleaning is of cardinal importance are too many and range from aerospace to microelectronics to biomedical. C. Beaudry and S. VerhaverbekeC. LeBlancCleaning with solid carbon dioxide pellet blastingCorrelating cleanliness to electrical performanceD. Ottesen, S. Sickafoose, H. Johnsen, T. Kulp, K. Armstrong, S. Allendorf and T. HoffardD.V. Shishkin, E.S. Geskin and B. GoldenbergD.V. Shishkin, E.S. Geskin and B. GoldenbergDecontamination of sensitive equipmentDevelopment of a technology for generation of ice particlesDevelopment of a generic procedure for modeling of waterjet cleaningDust removal from solar panels and spacecraft on MarsExperimental and numerical investigation of waterjet derusting technologyF.C. YoungFeiler and J. RalstonFine particle detachment studied by reflectometry and atomic force microscopyH.J. KaiserInfluence of cleaning on the surface of model glasses and their sensitivity to organic contaminationInvestigation of modified SC-1 solutions for silicon wafer cleaningJ. Skoufis and D.W. CooperJ.B. Durkee IIJ.K. Kirk Bonner and A. MehtaK. Babets and E.S. GeskinK. Babets, E.S. Geskin and B. GoldenbergK. Kearney and P. HammondLaser cleaning of silicon wafers: Prospects and problemsM. Mosbacher, V. Dobler, M. Bertsch, H.-J. Mnzer, J. Boneberg and P. LeidererM. OlimM.G. Benkovich and J.L. AndersonM.K. ChawlaM.T. AndreasMapping of surface contaminants by tunable infrared-laser imagingMethods for pharmaceutical cleaning validationsMicrodenier fabrics for cleanroom wipersMonitoring cleanliness and defining acceptable cleanliness levelsParticle removal using resonant laser detachmentPerformance qualification of post-CMP cleaning equipment in a semiconductor fabrication environmentPractical applications of icejet technology in surface processingQualifying a cleaning system for space flight printed wiring assembliesR. Kaiser and K. HaraldsenS. Trigwell, M.K. Mazumder, A.S. Biris, S. Anderson and C.U. YurteriSpatial and temporal scales in wet processing of deep submicrometer featuresT. MunsonThe fundamentals of no-chemistry process cleaningThe future of industrial cleaning and related public policy-makingThis volume contains a total of 24 papers, all rigorously peer reviewed and revised before inclusion, which deal with all kinds of contaminations on a host of surfaces. The topics covered include: mapping of surface contaminants; various techniques for cleaning surfaces; various techniques for monitoring level of cleanliness; acceptable cleanliness levels; ionic contamination; pharmaceutical cleaning validations; cleaning of glass surfaces; decontamination of sensitive equipment; no-chemistry process cleaning; waterjet cleaning; cleaning with solid carbon dioxide pellet blasting; cleanroom wipers; dust removal from solar panels and spacecraft on Mars; laser cleaning of silicon surfaces; particle removal; implications of surface contamination and cleaning; and future of industrial cleaning and related public policy-making.Tracking surface ionic contamination by ion chromatographyW. Birch, S. Mechken and A. Carr.
650		0	_aSurface contamination _xCongresses. _918619
650		0	_aSurface contamination. _918620
700	1		_aMittal, Kash L., _d1945- _eeditor. _918621
710	2		_aTaylor and Francis. _910719
776	0	8	_iPrint version: _z9789067643764
856	4	0	_uhttps://www.taylorfrancis.com/books/9789047403289 _zClick here to view.
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999			_c71851 _d71851